期刊文献+

圆柱形与圆锥形放电腔室中氢等离子体组分与状态研究

Research on State and Composition of Hydrogen Plasma in Cylindrical and Conical Discharge Reactors
下载PDF
导出
摘要 采用圆柱形和圆锥形的放电腔室,使用氢气作为放电气体在不同的射频功率下进行了放电。使用质谱诊断和Langmuir探针诊断相结合的方法对两种放电腔室中的氢等离子体的离子组分、离子能量分布(IED)、等离子体电势、电子密度和有效电子温度进行了对比研究。根据等离子体的诊断结果,讨论了圆锥形与圆柱形两种放电腔室中的放电特性。结果表明:圆柱形放电腔室中含有更多的亚稳态氢原子H*,而圆锥形放电腔室中含有更多的H+离子。圆锥形放电腔室中等离子体具有更高的电子密度和离子密度及更低的等离子体电势。 Cylindrical and conical discharge reactors were used for hydrogen discharge at different radio frequency powers.Using mass spectrometry and Langmuir probe,the ion composition,the ion energy distribution(IED),the plasma potential,the electron density and the effective electron temperature were investigated in both the discharge reactors.Based on plasma diagnostic result,the discharge property was discussed in both conical and cylindrical discharge reactors.The results show that there are more H+in conical discharge reactor,but more H*in cylindrical discharge reactor.In addition,it is shown that the electron and ion densities are higher and the plasma potential is lower in conical discharge reactor.
出处 《原子能科学技术》 EI CAS CSCD 北大核心 2016年第8期1491-1497,共7页 Atomic Energy Science and Technology
关键词 等离子体 等离子体诊断 放电特性 射频功率 plasma plasma diagnosis discharge property radio frequency power
  • 相关文献

参考文献21

二级参考文献65

  • 1李红轩,徐洮,陈建敏,周惠娣,刘惠文.射频功率对类金刚石薄膜结构和性能的影响[J].物理学报,2005,54(4):1885-1889. 被引量:24
  • 2马天宝,胡元中,王慧.基于原子运动模型的类金刚石薄膜生长机理研究[J].物理学报,2007,56(1):480-486. 被引量:15
  • 3CZECHOWICZ D G,CASTILLO E R,NIKROO A.Composition and structure stdudies of strong glow discharge polymer coatings[J].Fusion Science and Technology,2002,41:188-192.
  • 4THEOBALD M,BACLET P,LEGAIE O,et al.Doped CHx microshells prepared by radio frequency plasma enhanced chemical vapor deposition for inertial confinement fusion experiments[J].J Vac Sci Technol A,2001,19(1):118-123.
  • 5LETTS S A,MYERS D W,WITT L A.Ultrasmooth plasma polymerized coatings for laser fusion targets[J].J Vac Sci Technol,1981,19(3):739-742.
  • 6NEYTS E,BOGAERTS A,van de SANDEN M C M.Effect of hydrogen on the growth of thin hydrogenated amorphous carbon films from thermal energy radicals[J].Appl Phys Lett,2006,88:141922-1.
  • 7MIYAGAWA Y,NAKADATE H,IKEYAMA M,et al.Dynamic MC simulation for a-C:H deposition in methane plasma based on subplantation model[J].Diamond and Related Materials,2003,12:927-930.
  • 8HONG J,GOULLET A,TURBAN G.Ellipsometry and Raman study on hydrogenated amorphous carbon (a-C:H) films deposited in a dual ECR-r.f.plasma[J].Thin Solid Films,1999,352:41-48.
  • 9SOM T,MALHOTRA M,KULKARNI V N,et al.Correlation of hydrogen content with the microstructure of a-C:H films[J].Physica B,2005,355:72-77.
  • 10CZECHOWICZ D G,CASTILLO E R,NIKROO A.Composition and structural studies of strong glow discharge polymer coatings:general atomics report GA-A23753[R].[S.l.] :[s.n.] ,2002.

共引文献21

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部