AAO模板制备过程中电化学抛光工艺的研究

Research on Electrochemical Polishing Technology in Preparation of AAO Template

研究了在高氯酸/乙醇抛光液体系下,不同抛光电压(5、10、15、20 V)和抛光时间(2、3、4、5 min)的抛光工艺对抛光效果的影响。并且对抛光过程中的电流密度变化及抛光表面的光亮情况进行研究。结果表明,该体系的最佳抛光工艺:抛光电压15 V、抛光时间4 min(分两次抛光,每次时间为2 min)。

The effects of the polishing process of polishing voltage （5 V, 10 V, 15 V and 20 V） and polishing time （2 min, 3 min, 4 min and 5 min） on the polishing effect under the system of high acid / ethanol were studied. The changes of current density in polishing process and shiny situation of polishing surface were studied. The results show that the best polishing process is polishing voltage of 15 V and polishing time of 4 min （two polishing, each time for 2 min）.