期刊文献+

基于磁偏转的真空弧离子源成分诊断 被引量:2

Study on ion species of vacuum arc ion source with analysis of magnetic
下载PDF
导出
摘要 采用磁偏转的方法,对金属氢化物电极真空弧离子源放电产生的等离子体进行了成分诊断。采用了Ti D2电极材料进行放电,测量了在30-80 A弧流情况下的各离子的组分。实验结果表明,弧流越大时等离子体的密度越大,在现有引出结构下,由于等离子体发射面的凹凸变化导致测得的离子信号出现双峰。通过增加栅网可以减少等离子密度,双峰情况会有所减少。另外,随着弧流增大,氘所占比例会有所增加,弧流达到60 A以上氘含量增幅不明显。 Background: The metallic hydrogen (deuterium) electrode vacuum arc ion source which can discharge plasma mainly containing metal ions, hydrogen ions and deuterium ions, is generally used to the ion gun or the small accelerator. Purpose: To study the deuterium ions ratio affected by the arc current, the deuterium ion ratio produced by the discharge of vacuum arc ion source with metallic deuterium electrode was measured. Methods: To separate metal ions, hydrogen ions and deuterium ions, the magnetic analysis was used. And the ions current was measured by the scintillators and Faraday cups. Results: Experimental results showed that, within a certain range of arc current, the greater the plasma density is, the change of plasma emission surface affected the collective of ions current more obviously. And within the range of 30-80 A, deuterium ion ratio increased with the arc current, but the ratio became stable when arc current exceeded 60 A. Conclusion: The magnetic analysis platform can be used to obtain the deuterium ions ration of vacuum arc ion source. Within a certain range of arc current, the arc current can increase the deuterium ions ratio.
出处 《核技术》 CAS CSCD 北大核心 2016年第9期28-32,共5页 Nuclear Techniques
基金 国家自然科学基金(No.11405165 No.11475156)资助~~
关键词 真空弧 金属氢化物 离子源 离子种类 Vacuum arc, Metallic hydrogen, Ion source, Ion species
  • 相关文献

参考文献3

二级参考文献17

  • 1[1]奥切洛,弗拉姆,著.郑少白,译.等离子体诊断[M].北京:电子工业出版社,1994:34-39.
  • 2[3]Pruvis C K.Design Guidelines for Assessing and Controlling Spacecraft Charging Effect[J].NASA-T,1990(3):236-237.
  • 3[4]Mitchner M,Kruger C,Fontanesi M.A 400kHz,fast-sweep Langmuir Probe for Measuring Plasma Fluctuations[J].Review of Scientific Instruments,1999,70(6):2681-2688.
  • 4[6]Thomaz J C,Amorim J,Souza C F.Validity of Actiometry to Measure N and H Atom Concentration in N2-H2 Direct Current Glow Discharges[J].Phys.D:Appl.Phys.1999,32:3208-3214.
  • 5[7]Welzel T,Dani I,Richter F.Determination of Radical Densities by Optical Emission Spectroscopy During the ECR Plasma Deposition if Si-C-N:H Films Using TMS as a Precursor[J].Plasma Sources Sci.Technol,2002,11:351-359.
  • 6[8]Martin W C,Sugar J,Musgrove A 2004(updated).http://physics.nist.gov/cgi-bin/AtData/lines-form NIST Atomic Spectra Database Lines Data (for atomic energy levels and wavelengths).
  • 7过增元,电弧和热等离子体,1986年
  • 8Brown I G. Metal vapor vacuum arc ion sources[J] Review of Scientific Instruments, 1992, 63(4) 2351-2356.
  • 9Brown I G, Oks E M. Vacuum arc ion sources - a brief historical review[J]. IEEE Transactions on Plasma Science, 1997, 25(6): 1222-1228.
  • 10Anders A, Anders S, Jtittner B, et al. Pulsed dye laser diagnostics of vacuum arc cathode spots[J]. IEEE Transactions on Plasma Science, 1992, 20(4): 466-47.

共引文献4

同被引文献4

引证文献2

二级引证文献3

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部