液相剥离法制备高浓度石墨烯的研究

Preparation of High Concentration Graphene Solution by Liquid Phase Exfoliation

采用有机溶剂N-甲基吡咯烷酮(NMP)液相剥离法制备石墨烯,研究了超声功率和超声时间对石墨烯剥离效果的影响,利用拉曼(Raman)光谱、扫描电子显微镜(SEM)和透射电子显微镜(TEM)等研究了石墨烯的层数与形貌等微观特征.结果表明,有机溶剂NMP液相剥离法制得石墨烯方法简单易行,不同超声功率和超声时间对石墨烯剥离效果有明显影响,超声功率为50 W时,无氮气保护前提下的超声时间为30h,剥离效果最佳,石墨烯溶液浓度可达0.48mg/mL.石墨烯层数较少,大片层石墨烯的直径可达2μm.

Graphene was prepared by liquid-phase exfoliation in organic solvent N-methyl pyrrolidone（NMP）.The influence of graphene exfoliation was investigated in different ultrasonic power and time.Raman spectroscopy（Raman）,scanning electron microscope（SEM）and transmission electron microscope（TEM）were used to investigate the microstructure evolution of graphene.It is found that liquidphase exfoliation in organic solvent NMP is a simple method to produce graphene.Different ultrasound power and time have obvious influence on the graphene exfoliating effect.The maximum concentration of graphene is up to 0.48mg/mL in 50 W and 30h（no nitrogen protection）.Graphene layers are less layers.The diameter of graphene layers can be up to 2μm.