光电行业废磷酸蚀刻液萃取除杂实验研究

Research on the Extraction and Impurity Removal Experiment of the Waste Etching Solution with Phosphoric Acid in Optoelectronic Industry

光电行业产生的废磷酸蚀刻液具有强腐蚀性,属危险废物,如果不合理回收处理,将会造成资源浪费,环境污染,进而威胁人类的安全。文章选取深圳某光电企业废磷酸蚀刻液为原料,进行萃取除杂实验。经过一级萃取,反萃实验,多级回用研究,探索得到一个磷酸回收除杂效果较佳的技术方案。研究结果表明,磷酸三丁酯/N235/DT-100萃取体系中三者体积比为4∶1∶5,相比为1∶1,萃取时间为10 min时为较优的萃取条件,磷酸回收率为93.80%,硝酸去除率为82.65%;萃取剂具有重复处理废磷酸蚀刻液的能力。

The waste etching solution with phosphoric acid, which is highly corrosive produced by optoelectronic industry, is a kind of hazardous waste. Without being treated rationally, it will cause resource waste and serious environmental pollution, and threatening the safety of human beings. The waste etching solution which came from a optoelectronic company in Shenzhen was used as the raw material to do experiments of extraction impurities, aiming to explore a better technical solution to the recovery and impurity of phosphoric acid. After the study of single extraction, back extraction and multi-level reuse of extraction solvent, a better solution was explored. The study shows that the optimization conditions in the tributyl phosphate/N235/DT-100 extraction system are volume ratio of 4∶1∶5, phase ratio of 1∶1, and extraction time of 10 min. Under the conditions, the recovery rate of phosphoric acid is 93.80 %, and the removal rate of nitrate acid is 82.65 %. Meanwhile, the extraction agent has the reusability of disposing of the waste etching solution.