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Oxide Coated Cathode Plasma Source of Linear Magnetized Plasma Device 被引量:1

Oxide Coated Cathode Plasma Source of Linear Magnetized Plasma Device
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摘要 Plasma source is the most important part of the laboratory plasma platform for fundamental plasma experimental research. Barium oxide coated cathode plasma source is well recognized as an effective technique due to its high electron emission current. An indirectly heated oxide coated cathode plasma source has been constructed on a linear magnetized plasma device. The electron emission current density can reach 2 A/cm2 to 6 A/cm2 in pulsed mode within pulse length 5-20 ms. A 10 cm diameter, 2 m long plasma column with density 10is m-3 to 1019 m3 and electron temperature Te --~ 3-7 eV is produced. The spatial uniformity of the emission ability is less than 4% and the discharge reproducibility is better than 97%. With a wide range of the plasma parameters, this kind of plasma source provides great flexibility for many basic plasma investigations. The detail of construction and initial characterization of oxide coated cathode are described in this paper. Plasma source is the most important part of the laboratory plasma platform for fundamental plasma experimental research. Barium oxide coated cathode plasma source is well recognized as an effective technique due to its high electron emission current. An indirectly heated oxide coated cathode plasma source has been constructed on a linear magnetized plasma device. The electron emission current density can reach 2 A/cm2 to 6 A/cm2 in pulsed mode within pulse length 5-20 ms. A 10 cm diameter, 2 m long plasma column with density 10is m-3 to 1019 m3 and electron temperature Te --~ 3-7 eV is produced. The spatial uniformity of the emission ability is less than 4% and the discharge reproducibility is better than 97%. With a wide range of the plasma parameters, this kind of plasma source provides great flexibility for many basic plasma investigations. The detail of construction and initial characterization of oxide coated cathode are described in this paper.
作者 胡广海 金晓丽 袁林 张乔枫 谢锦林 李弘 刘万东 HU Guanghai JIN Xiaoli YUAN Lin ZHANG Qiaofeng XIE Jinlin LI Hong LIU Wandong(Department of Modern Physics, University of Science and Technology of China, Hefei 230026, Chin)
出处 《Plasma Science and Technology》 SCIE EI CAS CSCD 2016年第9期918-923,共6页 等离子体科学和技术(英文版)
基金 supported by National Natural Science Foundation of China(No.11275200)
关键词 oxide coated cathode plasma source magnetized plasma pulse discharge oxide coated cathode, plasma source, magnetized plasma, pulse discharge
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