摘要
选用四甲基硅烷作为富氢电子材料,利用拉曼光谱,分析其在室温高压（68.9~142.2GPa）下的振动模式和结构特性。结果表明：随着压力的增大,四甲基硅烷仅保留常压下的3个振动模式,且均被压力锁定;从72.2GPa开始,出现了新的振动模式,且均随着压力的增大而发生软化,预示着四甲基硅烷可能即将半金属化。
The vibrational and structural properties of tetramethylsilane were investigated using the Raman scattering measurements under pressures ranging from 68.9 to 142.2 GPa and at room temperature. The results revealed that 3 vibrational modes of tetramethylsilane under 68. 9 GPa remain locked in a certain position and are quite stable upon compression to 142.2 GPa. Moreover,new vibrational modes appear with the pressure going up to 72. 2 GPa and all exhibit softening with further compression,stiggesting that tetramethylsilane will become semi-metallic under such high pressures.
作者
秦振兴
张建波
QIN Zhen-Xing ZHANG Jian-Bo(Department of Physics, Taiyuan University of Science and Technology , Taiyuan 030024, China Department of Physics, South China University of Technology ,Guangzhou 510641 ,China)
出处
《高压物理学报》
CAS
CSCD
北大核心
2016年第5期375-379,共5页
Chinese Journal of High Pressure Physics
基金
国家自然科学基金青年科学基金(51502189)
太原科技大学博士启动项目(20132010
20132011)
山西省青年科技研究基金(2015021017)
山西省高等学校科技创新项目(2015167)
关键词
高压
四甲基硅烷
拉曼光谱
振动模式
半金属
high pressure
tetramethylsiiane
Raman spectroscopy
vibrational mode
semi-metallic
