美国专利默示许可与间接侵权:冲突中的平衡

The Patent Implied License and Contributory Infringement in U.S.A.:the Balance in the Conflict

在美国专利法上,间接侵权强化了对专利权人的保护,在一定程度上延伸了专利权的效力范围。专利默示许可作为侵权抗辩事由,与间接侵权相互制约。二者的对抗体现了不同主体之间此消彼长的利益关系,这种利益表现为对专利产品专用零部件(设备)市场的争夺。间接侵权与默示许可的冲突不是制度意义上的相互瓦解,而是对利益归属的程度把握问题,是专利权人和相对人得以公平博弈的制度砝码。正确认识二者的冲突,灵活掌握其适用规则,从而实现不同主体间的利益平衡是两种制度共存的价值所在。

Contributory infringement strengthens the protection for the patentee and extends the scope of the force of patent law.As the defense cause, implied license restricts contributory infringement mutually.The conflict between implied license and contributory infringement is essencially the interests conflict among the related parties.We should master the applied rules and treats properly the conflict.The value of coexistence of the above systems is to realize the interests balancing among the related parties.