高阻隔膜真空镀膜工艺专利分析

The Patent Analysis of High Performance Barrier Film by Vacuum Coating Process

本文通过查找高阻隔膜相关专利,认为通过设计铺层结构、增加阻隔层数目来提高阻隔性能将是高阻隔膜一重要发展方向。而为了兼顾成膜效率和膜层性能,在镀膜工艺及设备技术方面的发展也可大致分为两个方向,其一是设备的集成化处理,可实现单次沉积多个阻隔层;其二在于局部设备结构的优化,以提高采用现有技术所制备阻隔膜的性能。

To improve the barrier property of film,increasing the number of barrier layers and designing structure of these layers will be an important development direction of high barrier film.While,in order to take both the efficiency and performance into account,the development of coating technology and equipment can be divided into two directions.One is the integration of the device,which can realize the deposition of multiple barrier layers once;the other is optimization of local structure to improve the film performance coated by existing technology.