期刊文献+

1700V SiC SBD器件的研制

Development of 1 700 V SiC SBD Device
下载PDF
导出
摘要 介绍了1 700 V SiC SBD器件的结构设计、制造工艺、静态特性测试及可靠性摸底试验。通过模拟仿真得到了最佳的漂移区结构和器件结构;针对器件制造工艺中的钝化和金属化两项关键工艺进行原理分析和优化;对器件进行了正向和反向静态参数测试,表明器件耐压水平超过1 700 V,正向电流密度为118 A/cm^2;最后对器件进行了可靠性摸底试验,结果显示20只器件均通过了100个循环的温度冲击试验及168 h的高温反偏试验。 It presented the structure design, manufacture technology and static performance test of 1 700 V SiC SBD devices. The epitaxy material structure and device structure were obtained by simulation,two key pr℃esses including passivation and metalation were analyzed and optimized. Forward and reverse static performances of the devices were tested, and the test results indicated that the bl℃king voltage was over 1 700 V and the current density was 118 A/cm2. In addition, all the devices passed the 100-cycle temperature sh℃k test and 168 h high-temperature reverse bias.
出处 《大功率变流技术》 2016年第5期51-54,共4页 HIGH POWER CONVERTER TECHNOLOGY
基金 国家863计划(SS2014AA052402)
关键词 SIC SBD器件 欧姆接触 钝化工艺 高温可靠性 SiC SBD device ohmic contact passivation high-temperature reliability
  • 相关文献

参考文献7

二级参考文献57

  • 1杨克勤,陈厦平,杨伟锋,孔令民,蔡加法,林雪娇,吴正云.不同退火温度下金属/4H—SiC Schottky势垒高度的研究[J].量子电子学报,2005,22(2):251-255. 被引量:2
  • 2XU L H, PANG J H L, TU K N. Effect of electromigration-induced back stress gradient on nanoindentation marker movement in SnAgCu solder joints[J]. Appl Phys Lett, 2006, 89(22) : 221909-1-221909-3.
  • 3ZHANG L, OU S Q, HUANG J, et al. Effect of current crowding on void propagation at the interface between intermetallic compound and solder in flip chip solder joints[J]. Appl Phys Lett, 2006, 8(1): 012106-1-012106-3.
  • 4OUYANG F Y, CHEN K, TU K N, et al. Effect of current crowding on whisker growth at the anode in flip chip solder joints[J]. Appl Phys Lett, 2007, 91(23): 231919-1-231919-3.
  • 5SHAO T L, CHEN Y H, CHIU S H, et al. Electromigration failure mechanisms for SnAg 3.5 solder bumps on Ti/Cr-Cu/ Cu and Ni(P)/Au metallization pads[J]. Appl Phys Lett, 2004, 96(8) : 4518-4524.
  • 6YEH Y T, ChOU C K, HSU Y C, et al. Threshold current density of electromigration in euteetie SnPb solder[J]. Appl Phys Lett, 2005, 86(20): 203504-1-203504-3.
  • 7CHOI Zung-sun, MONIG REINER, THOMPSON C V. Dependence of the electromigration flux on the crystallographic orientations of different grains in polycrystalline copper interconnects[J]. Appl Phys Lett, 2007, 90(24) : 241913-1-241913-3.
  • 8HAU-RIEGE C S, HAU-RIEGE S P, MARATHE A P. The effect of interlevel dielectric on the critical tensile stress to void nucleation for the reliability of Cu interconnects[J]. Appl Phys Lett, 2004, 96( 10): 5792-5796.
  • 9FILl C K, GIGNAC L, ROSEN'BERG R. Reduced electromigration of Cu wires by surface coating[ J ]. Appl Phys Lett, 2002, 81(10): 1782-1784.
  • 10CHEN Z Z, QIN Z X, HU C Y. Ohmic contact formation of Ti/Al/Ni/Au to n-GaN By two-step annealing method[J]. Materials Science and Engineering B, 2004, 111 (1): 36-39.

共引文献8

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部