摘要
在自主搭建的压电雾化喷涂系统上,以RZJ-304正性光刻胶为研究对象,圆形抛光硅片为基材,研究了稀释体积比、预热温度以及喷涂层数对光刻胶薄膜平均厚度及均匀性的影响,并得到最佳工艺参数。以具有方形结构的抛光硅片为基材,分别进行压电雾化喷涂法和离心旋转法涂胶,并进行图案光刻,结果表明压电雾化喷涂法可以在非圆形形貌上得到清晰完整的图案,克服了传统离心旋转法无法在非圆形面上涂胶的缺陷,验证了压电雾化喷涂法在非圆形形貌应用中的可行性。
The effects of dilution volume ratio, preheating temperature and spray layer number on average thickness and uniformity of the film of RZJ-304 positive photoresist on polished round silicon wafer as substrate were studied by using a home-built piezoelectric spraying system and the optimal process parameters were determined. The polished silicon wafers with square patterns were coated with RZJ-304 by centrifugal spinning and piezoelectric spraying respectively and then photoetched. The results showed that clear and complete patterns can be formed on noncircular structures by piezoelectric spraying, overcoming the problem that noncircular surface cannot be coated by centrifugal spinning method and proving the feasibility of piezoelectric spraying for noncircular configurations.
出处
《电镀与涂饰》
CAS
CSCD
北大核心
2016年第20期1070-1073,共4页
Electroplating & Finishing
基金
国家自然科学基金仪器重大专项(61327811)
苏州市科学发展计划纳米技术专项(ZXG201433)
欧盟第七框架国际合作基金(PIRSES-GA-2013-612641)
关键词
正性光刻胶
压电雾化喷涂
平均厚度
均匀性
抛光硅片
方形结构
positive photoresist
piezoelectric spraying
average thickness
uniformity
polished silicon wafer
squarestructure