电沉积层厚度分布均匀性的研究进展

Study Progress of Electrodeposited Layer Thickness Distribution Uniformity

厚度分布尽可能均匀是绝大多数电沉积应用场合努力实现的目标。从电解液组分、电源、电沉积槽、阳极与阴极的结构形状及布局、电解液的搅拌方式等方面介绍了它们与电沉积层厚度分布之间的关系及其研究进展。协同改善电沉积过程中阴极的电场与流场分布是众多研究的主要思路,并在经验性改进方案和案例性数值仿真方面取得很大进展。未来的探索应更多地从理论角度提出通用性解决方案。

Uniform thickness distribution is the goal to be accomplished in most of the electrodepositing application cases. The relationships of thickness uniformity with the factors including electrolyte compositions, power supply, electrodepositing bath, electrodes and their arrangements, stirring manners,and their research progresses were introduced. Synergistically improving the distribution of electric field and flow field was the main concept of studying thickness uniformity problems involved in this paper. Great progress in the empirical practicality and numerical simulation applications has been made. Future studies should be focus on establishing general theories to guide the solutions of uniformly depositing.