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从专利文献分析化学气相沉积金刚石膜技术进展 被引量:2

Patent analysis on technology development of CVD diamond film
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摘要 化学气相沉积金刚石膜具有优异性能,在高新技术领域有着广泛应用。本文从国内外专利文献方面着重分析化学气相沉积金刚石膜技术研究与应用进展。 CVD diamond films have many particular properties and are widely applied in various high-tech fields. The research and application development of CVD diamond film technology is reviewed from related patents.
作者 范保虎 彭波南 张恒超 FAN Bao-hu PENG Bo-nan ZHANG Heng-chao(Patent Examination Cooperation Jiangsu Center of the Patent Office, SIPO Nanjing 210000 China)
出处 《真空》 CAS 2016年第5期37-40,共4页 Vacuum
关键词 化学气相沉积 金刚石膜 专利 chemical vapor deposition(CVD) diamond films patent
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