摘要
化学气相沉积金刚石膜具有优异性能,在高新技术领域有着广泛应用。本文从国内外专利文献方面着重分析化学气相沉积金刚石膜技术研究与应用进展。
CVD diamond films have many particular properties and are widely applied in various high-tech fields. The research and application development of CVD diamond film technology is reviewed from related patents.
作者
范保虎
彭波南
张恒超
FAN Bao-hu PENG Bo-nan ZHANG Heng-chao(Patent Examination Cooperation Jiangsu Center of the Patent Office, SIPO Nanjing 210000 China)
出处
《真空》
CAS
2016年第5期37-40,共4页
Vacuum
关键词
化学气相沉积
金刚石膜
专利
chemical vapor deposition(CVD)
diamond films
patent