宽带束离子注入机均匀性调节与控制方法研究

The Research of a Uniform Control Technique for High-Current Ribbon Beam Implanter

宽带束离子注入机的均匀性调节系统由线圈磁铁组及可调磁极组组成,通过分析调节原理,结合实际调试中获得的可调磁极组中单个磁极调节的束流均匀性影响曲线,拟合曲线,建立束流均匀性影响模型,进一步推导出调节模型。在实际应用中,设计合理的控制方法,根据束流的实际情况,采用内/外插值法,适时调节束流均匀性影响模型参数组,可改善模型的适应性。经过测试表明,采用基于束流均匀性调节模型的迭代调节方法,可实现束流均匀性调节,测试注入300 mm硅片的方块电阻均匀性达到1.17%。

The uniform control system is composed of coil group and adjustable pole groupin high-current ribbon beam implanter. By analysis for principle of adjustment, fitting the curve of effect of beam current uniform while a pole of pole group has been adjusted, a model for effect of uniform was established, further infer model for adjustment. For activity application, the reasonable control technique was designed, inside and outside interpolation based on actual beam is used to adjust the parameters of model for current uniform adjustment, flexibility of model is improved. Experiments show, by means of iteration algorithm, based on the model for beam uniform adjustment, the beam current uniformity can be adjusted, the measured dose un-uniformity of 300mm wafer is 1.17%.