面曝光快速成形过固化深度试验研究

Research on Over-cured Depth in Mask Projection Stereolithography System

为提高面曝光快速成形系统Z向微细结构的制作精度,采用正交试验的方差、极差分析方法,讨论分层厚度、曝光时间、树脂温度、液面等待时间等成形工艺参数对过固化深度的影响。研究结果表明:分层厚度、单层曝光时间对过固化深度有显著影响,树脂温度对过固化深度有一定影响,液面等待时间对过固化深度影响不显著。针对面曝光快速成形系统,得出了以减小过固化深度为优化目标的制作参数的最佳组合。试验结果表明:在最佳的制作工艺参数条件下,过固化程度明显减小。试验结果对于面曝光快速成形减小过固化深度,提高Z向精度有指导意义。

In order to increase the building accuracy of micro structure in mask projection stereolithography sys- tem process in Z direction, using the variance analysis and range analysis of the orthogonal experiment, the influence of resin temperature, layer thickness, exposure time and liquid surface waiting time on sintering parameters on over- cured depth was discussed. The results show that the layer thickness and exposure time significantly affect the over- cured depth, the resin temperature also affects the over-cured depth. The liquid surface waiting time affects little to the over-cured depth. Based on the experimental results, an optimal combination of decreasing the over-cured depth was concluded. The confirmation experimental results show that the over-cured depth has been significantly decreased with the optimal combination. The result of this experiment has great guidance to decrease over-cured depth and improve the building accuracy of micro structure in Z direction for the mask projection stereolithography system.