拼接干涉技术在同步辐射领域的发展现状及趋势

Current status and trends of stitching interferometry in synchrotron radiation field

针对同步辐射领域光学元件的口径逐渐增大,其面形测量精度的要求已达到纳弧度级的问题,本文研究了该领域先进的面形测量方法——拼接干涉技术,以实现光学元件的高分辨率二维测量。介绍了拼接干涉技术的基本原理,综述了目前同步辐射光学领域常用的面形测量设备——激光光束长程面形仪、高精度自准直纳米测量仪,以及拼接干涉仪的发展历程和特点,比较了它们各自的缺点和优势。最后,分析了拼接干涉涉及的主要误差来源,指出该技术的应用和发展趋势主要有拼接算法的创新,干涉仪测量的快速化,拼接干涉仪的商业化,以及拼接干涉技术与其他科学技术的融合等。

In synchrotron radiation field,the apertures of optical components increase gradually and their surface figure precisions have been demanded to be a nano-radian level.This paper researches the modern surface figure measurement methods in this field,stitching interferometry,to realize the high resolution two-dimensional measurement of optical components.The basic principles of the stitching interferometry are introduced.Then,a series of common optical surface shape measurement instruments in the synchrotron radiation field are overviewed,such as long trace profilers based on laser beams,high precision and auto-collimation measuring machines for nanometer optical components and stitching interferometers.It describes their development history and working characteristics and compares their shortcomings and advantages.Finally,this paper analyzes the main error sources involved in the stitching interferometry,and points out that the application and development trends of the technology are mainly the innovation of the stitching algorithm,the improvement of measuring speeds of interferometers,the commercialization of interferometers and the integration of the interferometry andother science technologies.