摘要
P型超薄锗抛光片是制作空间太阳能电池的衬底材料,表面质量状态的稳定性控制对于后续外延及器件质量有着重要的影响。通过分析抛光工艺过程、清洗工艺过程、包装质量对稳定性的影响,首次提出了采用表面微观平坦度和表面雾值来衡量锗抛光片表面质量优劣和稳定性,对于提高锗抛光片加工水平和统一控制标准,具有重要的意义。
P type ultra-thin germanium polished wafer is the substrate material to produce space solar cell,and the stability control of the surface quality state has an important influence on the subsequent epitaxy and the quality of the device.In this paper,by analyzing the polishing process,cleaning process and packaging process effects on stability,for the first time the microcosmic surface flatness and surface fog value is put forward to evaluate the surface quality and stability of germanium polished wafers,it has the vital significance to improve the level of germanium various processing and unified control standard.
作者
王云彪
杨洪星
耿莉
郭亚坤
WANG Yun-biao YANG Hong-xing GENG Li GUO Ya-kun(The 46^th Research Institute, CETC, Tianjin 300220, Chin)
出处
《中国电子科学研究院学报》
北大核心
2016年第5期527-531,共5页
Journal of China Academy of Electronics and Information Technology
关键词
锗抛光片
表面质量
微观平坦度
雾值
稳定性
germanium polished wafer
surface quality
the microcosmic surface flatness
surface fog value
stability
