用于丝网印刷的掺杂硅浆料

SCREEN-PRINTABLE DOPED SILICON PASTE

利用等离子体气相合成法制备硅纳米颗粒,配制出基于硅纳米颗粒的用于丝网印刷的掺杂硅浆料。当硅浆料中磷硅原子比不小于0.45、磷的质量分数浓度在6.32%以上,或硼硅原子比不小于0.90、硼的质量分数浓度在1.75%以上时,用丝网印刷硅浆料能够实现方块电阻在50Ω/□以下的重掺效果,表明掺杂硅浆料有望应用于太阳电池的制备。

We have prepared screen-printable boron （B）- and phosphorus （P）- doped silicon paste by using plasma- synthesized silicon nanoparticles. When the atomic ratio of P （B） to Si is not smaller than 0.45 （0.90） and the mass fraction of P （B） is larger than 6.32% （1.75%）, sheet resistances of 〈50Ω/口 may be realized for Si wafers by screen- printing Si paste. It is promising that screen-printable doped Si paste may be further improved to meet the demand of the manufacturing of Si solar cells.