磁控溅射法制备掺杂ZnO透明导电薄膜及其研究进展

Research Progress on Preparation of Doped ZnO Transparent Conductive Film by Magnetron Sputtering Method

磁控溅射技术以其显著的优点已成为工业镀膜主要技术之一。充分发挥磁控溅射镀膜技术的现有优势,寻找新的增长点,成为近年来人们研究的热点。介绍了磁控溅射镀膜技术的原理、特点;总结了近来磁控溅射法制备掺杂ZnO薄膜,主要是Al掺杂、Si掺杂、Al-H共掺杂ZnO薄膜的研究进展。并在此基础上对掺杂ZnO透明导电薄膜的发展趋势进行了展望。

Magnetron sputtering technology has been one of the leading technology in industrial thin film deposition due to its outstanding advantages.The basic principle,characteristics and development of magnetron sputtering technology are described in the paper.The progress in techniques of ZnO doping,including Al,Si,Al-H codoping are summarized.The prospect of doped ZnO conductive thin film is also described.