磁控溅射用难熔金属靶材制作、应用与发展

Manufacture,application and development of refractorymetal target used on magnetron sputtering

随着磁控溅射技术应用日益广泛,难熔金属靶材需求不断增大。就难熔金属靶材应用、制备及发展进行总结和探讨,分析了制作过程中致密度、纯度、晶粒尺寸及结晶取向对靶材性能的影响,并对难熔金属靶材的发展趋势进行展望。

With the application of magnetron sputtering increasing, requirement of refractory metal target kept ex- panding. Application, preparation and development of refractory metal target was summarized and discussed. Influ- ence of the density, the purity, the grain size and the crystal orientation to the target was analyzed. Development trend of the target was also forecasted.