摘要
随着磁控溅射技术应用日益广泛,难熔金属靶材需求不断增大。就难熔金属靶材应用、制备及发展进行总结和探讨,分析了制作过程中致密度、纯度、晶粒尺寸及结晶取向对靶材性能的影响,并对难熔金属靶材的发展趋势进行展望。
With the application of magnetron sputtering increasing, requirement of refractory metal target kept ex- panding. Application, preparation and development of refractory metal target was summarized and discussed. Influ- ence of the density, the purity, the grain size and the crystal orientation to the target was analyzed. Development trend of the target was also forecasted.
出处
《金属功能材料》
CAS
2016年第6期48-52,共5页
Metallic Functional Materials
关键词
磁控溅射
高纯难熔金属
靶材
magnetron sputtering
high purity refractory metal
target