摘要
对进一步提高光栅干涉仪定位检测系统的定位精度和位移检测分辨率进行了研究,分析了检测视场中干涉条纹的不同测量位置对定位系统的影响,提出了一种利用干涉相移进行超精密位移检测的新方法,在传统的光栅干涉仪系统中加入相位扫描机构,使光电传感器在检测视场中的两个干涉条纹间进行移动,从而改变了光栅干涉仪的接收相位,理论上可以达到纳米、亚纳米等更高精度的检测。精密定位检测实验表明,采用该检测定位方法可以提高定位精度16%以上。
Study on how to improve the positioning precision and displacement measuring resolution of posi-tioning system, basing on grating interferometer, is discussed. The influence of different measuring position of coherent fringe in the optical field to the positioning system is analyzed and a new method of phase shift of coherent fringe is developed. A phase-shift device is introduced to the grating interferometer system. The change of the grating phase, by moving the sensor between two interfere-fringes, leads to higher measuring resolution ability than that of laser interferometer in theory, even to nanometer or sub-nanometer. Experi-ments show that the new method will improve the positioning accuracy more than 16%.
出处
《组合机床与自动化加工技术》
北大核心
2016年第12期65-67,共3页
Modular Machine Tool & Automatic Manufacturing Technique
基金
国家自然科学基金面上项目(51275306)
关键词
光栅干涉仪
位移测量
条纹
相移
grating interferometer
displacement measurement
fringe
phase shift