基于矩阵积分法优化光刻部分相干成像模型

Optimizing photolithography partial coherent image model based on integral matrix method

基于矩阵积分法实现了Matlab对光刻部分相干二维成像的模拟,验证了Matlab编写的部分相干程序的可行性,加入了离焦对光刻分辨率的影响。通过建立部分相干光光刻仿真模型,并在二极照明方式下,对离焦对光刻成像的影响进行了模拟计算。结果表明,矩阵积分法降低了程序运算所用时间,微小的离焦对光刻部分相干成像影响巨大,必须考虑离焦对光刻分辨率造成的影响。

By using the integral matrix method, the Matlab simulation to photolithography partial coherent imaging has been achieved; the feasibility of partly coherent image program written has been confirmed; the defocus effects to photolithography have been considered as well. Using partial coherent image program, the defocus effects to photolithography have been simulated with the condition of defocus. The simulation results indicate that the integral matrix method can reduce the simulation time. Moreover, small defocus has significant influences on partly coherent image, thus defocus error must be considered when carryingon photolithography.