光学自由曲面化学磁性研磨抛光的表面粗糙度试验

Research on Surface Roughness of Optical Free Surface by Chemical Magnetic Abrasive Finishing

针对自由曲面光学玻璃研磨抛光存在的问题,提出通过数控技术结合化学磁性研磨技术来实现自由曲面光学玻璃的研磨抛光。应用正交试验设计对化学磁性研磨试验的4个因素进行研究,最终获得各个因素对于工件表面粗糙度影响的主次顺序,并确定其最优组合为:研磨时间60min,磁感应强度0.8T,研磨间隙1.0mm,磁极转速为3000r/min。

This paper identifies the existing problems about the free surface polishing of optical glass, and puts forward the application of numerical control technology combined with the chemical magnetic abrasive finishing in the optical free surface polishing. The chemical magnetic abrasive finishing experiments about 4 parameters were performed by using the orthogonal experimental design. Then, the various factors of the primary and secondary sequence of chemical magnetic abrasive finishing were obtained. It confirms the optimum combination the working time of 60min, the magnetic flux density of 0.8T,the working clearance of 1.0mm and the pole speed of 3000r/min.