电介质/金属/电介质结构透明导电薄膜的研究进展

Progress of dielectric/metal/dielectric transparent conductive multilayer films

电介质/金属/电介质(D/M/D)结构透明导电薄膜是经过独特设计的一类性能优良的透明导电薄膜,经过多年研究,其各项性能指标得到了极大地提高,其应用范围也在不断拓展,目前已可应用于诸多领域。主要论述了D/M/D多层透明导电膜的研究现状,包括膜层设计原理、材料选择机制,并总结了金属层厚度、金属退火温度对膜系结构、光学、电学性质的影响机制。

Dielectric/metal/dielectric （D/M/D） multilayer films are one kind of transparent conductive films with high performance by unique design. It is widely recognized and have been applied to many areas own to the outstanding performance.This paper discussed the status, the designable principle, the material selecting mechanism of this field. It also summaries the controlling factors that promote the film structure, the optical and the electrical properties： such as the metal layer thickness and annealing temperature.