磁控溅射SiC/Al复合薄膜的微观结构和力学性能

Microstructure and Mechanical Properties of SiC/Al Composite Films Prepared by Magnetron Sputtering

通过磁控溅射法制备了不同含量SiC的铝基复合薄膜。采用XRD、SEM、TEM和纳米探针分析了薄膜的微观结构和力学性能。结果表明:SiC以纳米级别的粒子态弥散分布于Al基体甚至以原子或者分子的状态固溶于Al的晶体中。薄膜的硬度在仅含0.78at%SiC时就可达到3GPa,约为纯Al薄膜的两倍。随SiC含量的提高,复合薄膜的硬度逐步提高,在SiC含量为8.84 at%时,复合薄膜的硬度达到5.6 GPa后,随SiC含量的进一步提高,该薄膜结构非晶化,硬度逐步降低。

Al based composite films with different SiC contents were prepared by magnetron sputtering method. The microstructure and mechanical properties of the films were analyzed by using XRD, SEM, TEM and nano-indenter. The results show that very tiny SiC particles in nanoscale uniformly distribute in Al matrix. Some of them may dissolve into Al crystal lattice in atom and molecule form. The hardness of the film containing 0.78% SiC increases to 3.0 GPa,which is two times as much as pure Al film. With the increase of SiC content, the hardness of the film increases gradually, which can achieve the highest value of 5.6 GPa when containing 8.84% SiC. When SiC content increases further, the structure of the composite film transforms into amorphous and its hardness reduces gradually.