摘要
The silver（Ag）/photoresist（PR）/Ag structure, widely used in plasmonic photolithography, is fabricated on silicon substrate. The surface roughness of the top Ag film is measured and analyzed systematically. In particular, combined with template stripping technology, the lower side of the top Ag film is imaged by an atomic force microscope. The topographies show that the lower side surface is rougher than the initial surface of the subjacent PR film, which is mainly attributable to the deformation caused by particle collisions during the deposition of the Ag film. Additionally, further measurements show that the Ag film deposited on the PR exhibits a flatter upper side morphology than that directly deposited on the silicon substrate. This is explained by the different growth modes of Ag films on different substrates. This work will be beneficial to morphology analysis and performance evaluation for the films in optical and plasmonic devices.
The silver（Ag）/photoresist（PR）/Ag structure, widely used in plasmonic photolithography, is fabricated on silicon substrate. The surface roughness of the top Ag film is measured and analyzed systematically. In particular, combined with template stripping technology, the lower side of the top Ag film is imaged by an atomic force microscope. The topographies show that the lower side surface is rougher than the initial surface of the subjacent PR film, which is mainly attributable to the deformation caused by particle collisions during the deposition of the Ag film. Additionally, further measurements show that the Ag film deposited on the PR exhibits a flatter upper side morphology than that directly deposited on the silicon substrate. This is explained by the different growth modes of Ag films on different substrates. This work will be beneficial to morphology analysis and performance evaluation for the films in optical and plasmonic devices.
作者
梁高峰
焦蛟
罗先刚
赵青
Gao-Feng Liang Jiao Jiao Xian-Gang Luo Qing Zhao(School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu 610054, China State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China)
基金
supported by the National Basic Research Program of China(Grant No.2013CBA01702)
the National Natural Science Foundation of China(Grant No.11275045)
