摘要
无钯沉铜的最大特点是采用Cu^(3+)离子作活化剂,这可缩短生产周期和生产成本,是一种很有发展前途的新工艺。
Electroless Copper Plating without Palladium Catalyst is upgrade version of It has an obvious characteristic to adopt tri-valence cuprous ion as activator. This technology can period and production cost. It is a kind of new technique which has been developed. conventional PTH. shorten production
作者
邬通芳
张卫
刘镇权
吴培常
WU Tong-fang ZHANG Wei LIU Zhen-quan WU Pei-chang
出处
《印制电路信息》
2017年第2期23-30,52,共9页
Printed Circuit Information
关键词
无钯沉铜
混合电位
组装
Electroless Copper Plating Without Palladium Catalyst
Mix Potential
Microassembly