米级弯月面化学薄膜涂覆装备的研制

Meter-scale thin film coating equipment based on meniscus-coating technology

弯月面化学涂膜技术因其具有大面积、低成本以及高效率等优势成为继旋涂、喷涂等传统涂膜工艺后极具发展潜力的新型化学薄膜涂覆技术。本文针对国家某重大项目对米级光学元件表面的化学薄膜涂覆需求,对基于弯月面涂胶的技术原理进行了系统研究,分析了涂胶压强、基片和狭缝间距以及材料亲疏水性与涂胶面形态的关系,实现了对弯月液面的精密调控并研制出基于弯月面化学薄膜涂覆技术的装备,在1 400mm×420mm尺寸玻璃基片上实现了光刻胶的均匀涂覆,使整体胶膜厚度误差<4%,满足了米级元件表面精密化学薄膜的涂覆需求。

The meniscus chemical coating technology becomes a very promising new chemical thin-film coating technology after traditional coating technologies such as spin-coating and spray coating due to its merits of large area,low-cost and high efficiency.To meet the requirements of one national major projects on the meter-scale chemical thin film coating of optical component surface,based on the systematical research of the meniscus chemical film coating principal,static and dynamic gluing experiments were respectively conducted,and the relationships among the gluing pressure,the gap between substrate and slit,the material hydrophobicity and the morphology of meniscus were analyzed,then the fine tuning of the meniscus could be achieved and equipment based on the meniscus chemical thin film coating technology was developed.The coating uniformity of photo-resist was realized using this equipment on the glass substrate sizing 1 400 mm× 420 mm,making overall coating thickness error less than 4％ and satisfying coating requirements of meter-scale chemical precision thin film coating of optical component surface.