摘要
以六亚甲基二异氰酸酯(HDI)、4,4′-二羟基二苯甲酮(DHBP)、N-甲基二乙醇胺(MDEA)为原料,合成出主链含有夺氢型光引发剂以及共引发剂胺结构的NCO封端的聚氨酯预聚体,将预聚体接枝到纳米SiO_2表面,得到具有聚氨酯结构的光敏性纳米SiO_2(PU-photo-SiO_2),然后将其添加到聚氨酯丙烯酸酯树脂(PUA)中制备出光固化复合膜。红外光谱证实了PU-photo-SiO_2的成功合成;扫描电镜、热重分析、冲击强度等研究表明,PU-photo-SiO_2与光固化PUA树脂的相容性较好,利于提高光固化膜的热稳定性和力学性能。
NCO-terminated polyurethane prepotymer, with in-chain moieties of hydrogen-abstraction photoinitiator and co-initiator, was synthesized with hexamethylene diisocyanate （HDI）, 4, 4＇-dihydroxydiphenyl （DHBP）, and N-methyldiethanolarnine （MDEA）. The prepolymer was then grafted onto the surface of nanosilica to achieve photosensitive nanosilica （PU-photo-SiO2）. Finally, the PU-photo-SiO2 was dispersed into polyurethane acrylate （PUA） resin to prepare W-curing hybrid film. FT-IR confirms the structure of PU-photo-SiO2. The results of SEM, TGA and impact resistance indicate that the good compatibility between PU-photo-SiO2 and PUA resin is favorable for improving the thermal stability and mechanical properties of W-curing film.
出处
《高分子材料科学与工程》
EI
CAS
CSCD
北大核心
2017年第2期34-38,共5页
Polymer Materials Science & Engineering
基金
江苏省高校自然科学研究重大项目(11KJA430010)
江苏省青蓝工程(学科带头人)和江苏省产学研前瞻性联合研究项目(BY2015057-27)
