1H Meiling, W de Boeij, F Bornebroek, et al..From performance validation to volume introduction of ASML′s NXE platform [C].SPIE, 2012, 8322: 83221G.
2M Lowisch, P Kuerz, O Conradi, et al..Optics for ASML′s NXE:3300B platform [C].SPIE, 2013, 8679: 86791H.
3M Goldstein, R Hudyma, P Naulleau, et al..Extreme-ultraviolet microexposure tool at 0.5 NA for sub-16 nm lithography [J].Opt Lett, 2008, 33(24): 2995.
4H Glatzel, D Ashworth, M Bremer, et al..Projection optics for extreme ultraviolet lithography (EUVL) micro-field exposure tools (METs) with a numerical aperture of 0.5 [C].SPIE, 2013, 8679: 867917.
5E Tejnil, K A Goldberg, J Bokor.Phase effects owing to multilayer coatings in a two-mirror extreme-ultraviolet schwarzschild objective [J].Appl Opt, 1998, 37(34): 8021-8029.
6C Liang, M R Descour, J M Sasian, et al..Multilayer-coating-induced aberrations in extreme-ultraviolet lithography optics [J].Appl Opt, 2001, 40(1): 129-135.
7S Edlou, L Sun, C Synborski.Coating induced phase aberration in a Schwarzschild objective [C].SPIE, 2008, 7067: 706709.
8ORA.Defining Coating and Cement Data [CP].in Code V Electronic Document Library, Optical Research Associates, 2009, Vol.II: 7-28-7-29.
9ZEMAX.Defining coatings in ZEMAX [CP].in ZEMAX Optical Design Program User′s Guide, ZEMAX Development Corporation, 2009, Ch.20: 583-597.
10M F Bal, M Singh, J J M Braat.Optimization of multilayer reflectors for extreme ultraviolet lithography [J].J Micro/Nanolith MEMS MOEMS, 2004, 3(4): 537-544.
