溅射时间对ZnO/TiO_2复合薄膜亲水性的影响

Effects of Magnetron Sputtering Time on Properties of ZnO/TiO_2 Composite Thin Films

采用复合靶射频磁控溅射方法制备了ZnO/TiO_2复合薄膜,对薄膜500℃退火处理2 h。利用XRD和AFM对薄膜的晶体结构和表面微观形貌进行了表征,分析讨论了不同溅射时间下制备的薄膜的亲水性。结果表明:溅射时间为120 min时制备的薄膜经过退火处理后,具有锐钛矿和金红石混晶结构,而且具备最佳的亲水性和光致亲水性。

The ZnO/TiO2 composite thin films were deposited on glass by composite target radio frequency magnetron sputtering method, and then annealed at 500℃ for 2 h. The crystal structure and surface morphology of the films were characterized by XRD and AFM, and the effects of magnetron sputtering time on the hydrophilic properties of ZnO/TiO2 films were discussed carefully. The results showed that the ZnO/TiO2 composite thin films which were prepared at the sputtering time of 120 min and annealing treatment at 500℃ for 2 h had the anatase and rutile mixed crystal structure as well as the optimal hydrophilic properties and photoinduced hydrophilicity.