不同还原剂种类对石墨烯结构与性能的影响

Influence of different reductant types on the structure and performance of graphene

通过水合肼和氢碘酸分别对氧化石墨烯薄膜进行还原处理,制备出不同形态的石墨烯材料,并采用XRD、FT-IR、SEM及TEM等对实验样品进行结构表征。结果表明:氧化石墨烯薄膜在水合肼中由于完全分散导致还原更加彻底,而在氢碘酸中由于依旧保持薄膜状导致还原程度较低,但经由氢碘酸还原后保持薄膜状的石墨烯因为结构完整、致密度高从而具有更好的导电性能,方块电阻最低为10Ω/□。

Different morphological graphene materials were prepared by different type of reductants.XRD,FTIR,SEM and TEM were used to analyze the functional groups and structural changes of samples.The electrical performance of samples were tested by sheet resistance meter.The results showed that the graphene oxide film could be completely decentralized in hydrazine hydrate but still existed as film in hydroiodic acid.As a result,the graphene was reduced more completely by hydrazine hydrate than hydroiodic acid.On the other hand,the graphene film which was reduced by hydroiodic acid had a better conductivity because of its complete structure and high density.The minimum square resistance of graphene film reduced by hydroiodic acid was 10Ω/□.