超高色域图案化量子点彩膜的研究

Ultro-high color gamut and patterned color filter based on quantum dot photoresist

平板显示中影响色域的两个关键因素为背光源发光光谱特性和彩色滤光片的透过光谱特性。在TFT-LCD的高色域领域,为了实现BT2020标准,我们开发了量子点光刻胶替代彩色滤光片的方法。首先合成新型的量子点光刻胶,将其作为色彩转换膜制备在彩色滤光片下方,通过背光激发量子点自发光,可得到色纯度更高的红绿光。研究表明,自主开发的量子点光刻胶可以有效地进行色转换,可耐受光刻工艺,在高温烘烤和碱性显影下,可保持一定转换效率,且能实现pattern化,避免目前用白光直接搭配彩膜的漏光问题,有效地提高色域。

The spectra of color filter and back light are important factors that affect color gamut in display area.In order to achieve higher color gamut（BT2020）in TFT-LCD area,we developed a novel quantum dot resist which can displace color filter and improve color pure.This quantum dot resist could be patterned through photo process including cleaning,coating,exposure,developing and post bake.The result indicates that quantum dot resist can achieve higher color gamut than quantum dot BLU.