EUV光刻技术与摩尔定律

EUV Lithography and Moore's Law

光刻技术要数现代集成电路上的第一大难题。光蚀刻系统制造的精细程度取决于很多因素。但是实现跨越性进步的有效方法是降低使用光源的波长。现在,晶圆制造的工艺技术发展的确到了一个转折点。有人认为EUV光刻能够拯救摩尔定律,但事实是否真的如此还有待验证。

The first problem of modern integrated circuit is in lithography. The degree of refinement in lithography systems depends on a number of factors. However, the effective way to achieve leapfrog progress is to reduce the wavelength of the light source. Now, the development of wafer manufacturing technology is indeed a turning point. Some people think that EUV lithography can save Moore＇s law, but the fact is that it has to be verified.