高定向纳米金刚石膜的高功率微波等离子体化学气相沉积研究

A Study of Highly Oriented Nanocrystalline Diamond Films by Using High Power Microwave Plasma Chemical Vapor Deposition

采用高功率微波等离子体化学气相沉积法制备了高定向的纳米金刚石膜,研究了制备过程中促进<100>高定向纳米金刚石膜的生长条件与生长规律间的关联,并采用扫描电镜、原子力显微镜、拉曼光谱和X射线衍射仪对在不同实验条件下选择相同的氮气和氧气添加比例所制备的样品形貌、光学性质和晶向织构进行表征分析.研究结果表明,<100>高定向纳米金刚石膜的形成是各种生长条件的综合效应,相同的氮气和氧气添加并非是其形成的必然条件.

In contrast to the conventional method for the preparation of nanocrystallilne diamond（NCD） films us-ing a large amount of argon/hydrogen and a small amount of methane chemistry by chemical vapor deposition（CVD）, the authors of this paper have developed a new method by using a small amount of nitrogen and oxygenaddition into conventional hydrogen/methane plasma to fabricate NCD films. By using this method, not only canthe high rate growth of NCD films be achieved under high power conditions, but a highly 〈100〉 oriented NCDfilm can also be produced. So there arises the question of what kind of growth conditions can promote the forma-tion of NCD films of high 〈100〉 orientation.The paper investigated the relationship between the growth charac-teristics and the growth conditions of NCD films prepared by high power microwave plasma CVD. The sameamount of nitrogen and oxygen addition under different growth conditions were employed in the paper to fabri-cate NCD films. The morphology, quality, orientation and texture of the diamond samples were characterized byusing scanning electron microscopy, Raman spectroscopy and X-ray diffraction. The results show that the forma-tion of 〈100〉 highly oriented NCD film is the combined effect of various growth conditions, while the sameamount of nitrogen and oxygen addition is not a prerequisite condition for its formation.