新一代蚀刻气六氟-1,3-丁二烯的性质、制备和应用

Properties, preparation and application of new generation etching gas hexafluoro-1,3-butadiene

详细介绍了电子工业用新一代蚀刻气六氟-1,3-丁二烯(HFBD)的性质、制备和提纯工艺,并指出了各种工艺的优缺点。同时介绍了HFBD的储运规范、应用情况以及国内外市场概况等。

The properties, preparation and purification process of the new generation etching gas hexafluoro-1, 3-butediene （HFBD） for use in the electronic industry are introduced in detail. The advantages and disadvantages of various technology are pointed out. Meanwhile the storage and transportation specifications, application situation and market survey at home and abroad of HFBD are introduced.