溅射功率对ZnO/TiO_2复合薄膜性能的影响

Influence of magnetron sputtering power on the property of ZnO/TiO_2 composite film

采用射频磁控溅射法在玻璃基底制备了ZnO/TiO_2复合薄膜,利用SEM、XRD对薄膜的表面形貌和晶体结构进行了表征,分析了不同溅射功率对薄膜的亲水性和光催化性能的影响。结果表明,溅射功率为140W时,再经500℃退火2h处理后的薄膜具有锐钛矿和金红石混晶结构,并具备最佳的亲水性能;随着溅射功率的增加,ZnO/TiO_2复合薄膜的光催化性能升高。

ZnO/TiO2 composite films were prepared on glass substrates by radio-frequency magnetron sputtering.The surface morphology and crystal structure of films were studied by SEM and XRD.Effects of magnetron sputtering power on the hydrophilic and photocatalysis properties of films were also investigated.The results indicated that ZnO/TiO2 films possessed anatase and rutile mixed crystal structure and had the optimum hydrophily at the magnetron sputtering power of 140 W and 500℃ annealing treatment for 2hours.Furthermore,the photocatalytic properties of films increased with increasing the sputtering power.