辐射成像印版前体耐化学品技术

Chemical Resistance Technology to Radiation-Imageable Printing Plate Precursors

具有优异的耐化学品特性是高端印刷版材的重要指标之一,印刷版材耐化学品技术是目前印刷版材研究开发的热点。文章对世界各大印版生产厂商公开的专利技术及文献资料进行了分析,并对辐射成像印刷版材耐化学品前体开发所采用的技术进行归纳总结。文章最后对耐化学品版材的开发提出了建议:1、感光层中加入亲水的或者含有强极性化学键的添加树脂;2、成膜树脂改性,引入亲水基团、强极性基团或者刚性基团,同时不要牺牲树脂的碱溶性;3、辐射成像机理的优化与改进,可以引入混合机理,增强成像能力,油墨接触成像层变线性结构为立体网状结构。

Excellent chemicals resistance property is one of the important indicators to high-end printing plate.Today, the chemical resistance technology is a hot spot of printing plate resarch and development .In this paper, the patents and technical documents of the world＇s major manufacturers were analyzed, The chemical resistance technology to radiation-imageable printing plate precursors is summarized. Finally, the artide gives suggestions on developing chemical resistance printing plates： 1, The photosensitive layer is added with hydrophilic or strong polar resin;2, The membrane resin is modified through the introduction of hydrophilic, strong polar or rind groups, at the same time do not sacrifice the alkali solubility of resin;3, The mechanism of radiation imaging is optimized and improved ,the imaging ability is improved by introducing hybrid mechanism and the ink contact imaging layer is changed into a three-dimensional network structure from a linear structure.