真空度对Ni80Cr20薄膜中性度的影响

The influence of vacuum on neutrality of Ni80Cr20 filter

理论计算了Ni、Cr和Ni80Cr20三种材料的光学特性,确定了镍铬成份变化对Ni80Cr20的影响。在高低两个真空度条件下采用电子枪蒸发工艺进行了Ni80Cr20的镀膜实验,结果表明,低真空度时"薄"膜的中性度较好,而高真空度时"厚"膜中性度较好。采用X射线能谱分析发现"薄"膜铬含量高于膜料,而"厚"膜更高,高真空度薄膜略有氧化,而低真空度氧化更严重。从残余气体和蒸发方式方面分析了镍铬成份差异的原因,再结合氧化对薄膜特性的影响,确定了不同真空度薄膜中性度差异的原因。

The optical characteristics of Ni,Cr and Ni80Cr20 were calculated in theory to determine the impact on Ni80Cr20 when changing the proportions of nickel and chromium.Electron gun evaporation experiments were carried out separately at high vacuum and low vacuum conditions.The results showed that the ＂thin＂ film had better neutrality when coated at low vacuum,while the ＂thick＂ film had better neutrality when coated at high vacuum.X-ray spectroscopy analysis found that the ＂thin＂ film had a little more chromium and the ＂thick＂ film even had much more chromium than the amount in coating material.Furthermore,the film is slightly oxidized at high vacuum and even severely at low vacuum condition.The influence in the compositions of nickel and chromium in the film by residual gas and evaporation way was analyzed.The influence over the optical characteristics by oxidation was discussed.The reason for different neutrality of films coated at different vacuum was found.