多弧离子镀与磁控溅射共沉积TiN/TiCN多层膜的高温抗氧化性能

Oxidation Resistance at High-Temperature of TiN/TiCN Multilayer Films Prepared by Combining Multi-Arc Ion Plating and Magnetron Sputtering Technique

TiN/TiCN多层膜的高温抗氧化性研究对于扩大其应用领域具有重要作用,但目前鲜见相关报道。采用多弧离子镀与磁控溅射技术以不同调制周期在304不锈钢表面共沉积TiN/TiCN多层膜。采用XRD、XPS、倒置显微镜及高温氧化试验研究了多层膜的高温抗氧化行为。结果表明:TiN/TiCN多层膜表面光滑平整、均匀致密,薄膜主要为具有Ti-(C,N)键的fcc-TiN结构;随着调制周期的减小,TiN/TiCN多层膜生长取向发生转变,且具有(111)晶面生长织构;随着氧化温度的升高,多层膜的显微硬度逐渐降低,氧化增重速率不断增大,且在700℃之后变化速率较快,薄膜的开始氧化温度约为750℃;随着调制周期的减小,多层膜TiN与TiCN界面层数量增多,促使晶粒细化,提高了其致密性,还隔断了缺陷贯穿薄膜的连续性,显著降低了薄膜的孔隙率,致使O原子扩散困难,增强了薄膜的高温抗氧化性能。

TiN/TiCN muhilayer films were deposited on 304 stainless steel by combining multi-arc ion plating and magnetron sputtering technique. The oxidation resistant behavior of muhilayer films at high temperature was investigated by XRD, XPS, inverted microscope and oxidation test at high temperature. Results showed that the TiN/TiCN multilayer films were smooth, uniform and compact, mainly composed of a fcc -TiN structure with Ti- （ C, N） bond. With the decrease of modulation period, the growth orientation of film changed, and （ 111 ） crystal texture existed. With a rise of oxidation temperature, the micro-hardness of muhilayer films gradually decreased and the oxidation weight gaining rate increased, getting more obvious change after 700℃. The beginning oxidizing temperature of the film was about 750℃. Furthermore, as the modulation period decreased, the interface number between TiN and TiCN of muhilayer films increased, which attributed to the refinement of film grain and improvement of film compactness. Meanwhile, the continuity of defects throughout films was cut off and the porosity of the film was significantly reduced so that the diffusion of O atoms was difficult and the oxidation resistance at high temperature of the film was enhanced.