期刊文献+

Performance analysis of SiGe double-gate N-MOSFET

Performance analysis of SiGe double-gate N-MOSFET
原文传递
导出
摘要 The major purpose of this paper is to find an alternative configuration that not only minimizes the limitations of single-gate(SG) MOSFETs but also provides the better replacement for future technology.In this paper,the electrical characteristics of SiGe double-gate N-MOSFET are demonstrated and compared with electrical characteristics of Si double-gate N-MOSFET.Furthermore,in this paper the electrical characteristics of Si doublegate N-MOSFET are demonstrated and compared with electrical characteristics of Si single-gate N-MOSFET.The simulations are carried out for the device at different operational voltages using Cogenda Visual TCAD tool.Moreover,we have designed its structure and studied both Id-Vg characteristics for different voltages namely 0.05,0.1,0.5,0.8,1 and 1.5 V and Id-Vd characteristics for different voltages namely 0.1,0.5,1 and 1.5 V at work functions 4.5,4.6 and 4.8 eV for this structure.The performance parameters investigated in this paper are threshold voltage,DIBL,subthreshold slope,GIDL,volume inversion and MMCR. The major purpose of this paper is to find an alternative configuration that not only minimizes the limitations of single-gate(SG) MOSFETs but also provides the better replacement for future technology.In this paper,the electrical characteristics of SiGe double-gate N-MOSFET are demonstrated and compared with electrical characteristics of Si double-gate N-MOSFET.Furthermore,in this paper the electrical characteristics of Si doublegate N-MOSFET are demonstrated and compared with electrical characteristics of Si single-gate N-MOSFET.The simulations are carried out for the device at different operational voltages using Cogenda Visual TCAD tool.Moreover,we have designed its structure and studied both Id-Vg characteristics for different voltages namely 0.05,0.1,0.5,0.8,1 and 1.5 V and Id-Vd characteristics for different voltages namely 0.1,0.5,1 and 1.5 V at work functions 4.5,4.6 and 4.8 eV for this structure.The performance parameters investigated in this paper are threshold voltage,DIBL,subthreshold slope,GIDL,volume inversion and MMCR.
出处 《Journal of Semiconductors》 EI CAS CSCD 2017年第4期38-44,共7页 半导体学报(英文版)
关键词 double gate MOSFET DIBL GIDL volume inversion SiGe Genius tool double gate MOSFET DIBL GIDL volume inversion SiGe Genius tool
  • 相关文献

参考文献1

二级参考文献30

  • 1I.T.R.S., 2008.
  • 2Wong H S P. Beyond the conventional transistor. IBM J Res De- vices, 2002, 46:133.
  • 3Wong H S P, Frank D J, Solomon P M. Device design consider- ations for double-gate, ground-plane, and single-gated ultra-thin SOI MOSFET's at the 25 nm channel length generation. IEDM Tech Dig, 1998:407.
  • 4Kolberg S. Modeling of electrostatics and drain current in nanoscale double-gate MOSFETs. PhD Thesis, Norwegian Uni- versity of Science and Technology, 2007.
  • 5Suzuki K, Sugii T. Analytical models for n+-p+ double-gate SOI MOSFET's. IEEE Trans Electron Devices, 1995, 42:1940.
  • 6Taur Y, Liang X, Wang W, et al. A continuous, analytic drain- current model for DG MOSFETs. IEEE Electron Device Lett, 2004, 25:107.
  • 7Hariharan V, Vasi J, Rao V R. Drain current model including velocity saturation for symmetric double-gate MOSFETs. IEEE Trans Electron Devices, 2008, 55:2173.
  • 8Reyboz M, Martin P, Poiroux T, et al. Continuous model for in- dependent double gate MOSFET. Solid-State Electron, 2009, 53: 504.
  • 9Mohammadi S, Afzali-Kusha A. Modeling of drain current, ca- pacitance and transconductance in thin film undoped symmetric DG MOSFETs including quantum effects. Microelectron Reliab, 2010, 50:338.
  • 10Ioannidis E G, Theodorou C G, Tsormpatzoglou A, et al. Ana- lytical low-frequency noise model in the linear region of lightly doped nanoscale double-gate metal-oxide-semiconductor field- effect transistors. J Appl Phys, 2010, 108:064512.

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部