涂胶显影技术改进对光刻工艺的影响

Coating and Developing Technology Introduction Affects Lithography Process

影响光刻工艺的因素有很多,既有光刻机的因素,又有涂胶显影技术因素,而通过改造光刻机来提高光刻工艺,往往价格非常高昂;所以改进涂胶显影技术就成为了提高光刻工艺的一种低廉而有效的手段。介绍了对涂胶显影技术改进,且分析了其对光刻工艺的影响。

There are many factors that affect lithography process, such as lithography machine, coasting and developing technology. It is very expensive to improve lithography process by improvement to lithography machine. Therefore, improvement of coating and developing technology has become a cheap and effective means to improve lithography process. This paper gives a detail introduction of the improvement of coating developing technology and analyzes its important impact on lithography process.