面向特征建模方式的微器件表面微加工掩膜推导方法

Mask deduction for surface micromachining of micro-devices oriented feature modeling

针对微机电系统传统设计方法中,微器件的结构设计过程不够直观,三维模型的更改需要根据掩膜的更改来推导完成。提出了一种算法以实现由微器件三维特征模型自动推导出掩膜版图。在完成对微器件三维特征模型工艺分层之后,每一工艺层分别包含各自的特征结构,再根据各个工艺层的结构信息和材料信息,利用提出的掩膜推导算法,在沿微器件加工方向的正方向完成掩膜的逐层推导。并在VC环境下基于Open CASCADE三维内核开发相关应用程序,来完成对掩膜推导算法的验证。通过实例验证表明,此算法具有可行性,可以实现掩膜的自动生成,较传统设计方法更加直观、高效。

Aiming at the deficiency in the traditional design method of MEMS devices that the structure design process of the micro-devices is not intuitive enough,a new method to realize automatic mask generation from 3D feature model of micro-devices was proposed. After completing the process layering of 3D feature model of micro device,according to structural information and material information of each process layer,mask derivation was accomplished layer by layer along the positive direction of the processing of micro-devices,using mask derivation algorithm proposed. The relevant applications were developed in the VC environment based on Open CASCADE 3D kernel to verify mask derivation algorithm. The instance showed that this method allows designers to put more time on the structure design of the devices,it is more intuitive and efficient comparing with the traditional method.