衬底对微米金刚石薄膜制备及特性的影响

The Influence of Substrate to the Preparation and Properties of Micro-Diamond Film

通过改变处理衬底表面的方法,制备出不同的微米金刚石薄膜。具体的方法是利用磁控溅射在陶瓷衬底上面镀上一层厚金属钛,对金属钛层进行不同的表面处理后,放在微波等离子体化学气相沉积腔中制备微米金刚石薄膜。对不同的薄膜用二极管型结构测试了它们的场致发射电子的性能,良好的表面处理能达到在电场2.1 V/μm下,9.2 m A/cm^2优秀的发射效果。并对发射机理和场发射特性进行了深入的研究。

By changing the processing method on the surface of the substrate, the different micron diamond film is prepared. Specific method is to use the magnetron sputtering plating on ceramic substrate on a thick layer of titanium. After making the titanium layers with different surface treatment, the titanium layers is put into the cavity for microwave plasma chemical vapor deposition to prepare micron-diamond films. The different micron-diamond films were used in diode structure to test performance of their field emission electron. The field emission current can be achieved to show an excellent effect 9.2 mA/cm2 under the electric field of 2.1 V/μm. And the emission mechanism and the field emission properties were studied.