电场增强的阴极弧放电TiCN薄膜结构及性能研究

Microstructure and Surface Properties of TiCN Films Using Cathodic Arc Deposition Enhanced by Additional Electric Field

采用一种新型的电场增强阴极弧沉积技术在304不锈钢表面制备了TiCN涂层。研究了附加电极电流对阴极弧放电特性、涂层相结构、截面形貌、耐磨性以及结合力的影响。结果表明:附加电极的引入显著增加真空室内等离子体密度,工件偏流提高近100%;只有超过一定阈值,附加电极电流才能有效减小晶粒尺寸、提高膜层致密性,同时也提高膜基结合力。附加电极电流为30 A时,膜基结合力达到HF1,相对于无附加电极情况样品表面摩擦系数降低了33%,磨痕宽度最小,耐磨性最好。可见电场增强阴极弧放电是一种非常有效的TiCN制备方法。

TiCN coatings were deposited on 304 stainless steel by newly developed cathodic arc deposition enhanced by additional electric field. The effects of the additional electrode current on cathode arc discharge, film microstructure, cross-sectional morphology, wear resistance and adhesion between the film and the substrate were investigated. Results show that the plasma density substantially increases after the introduction of additional electrode in the chamb-er and the substrate current is improved by nearly 100%. Only a properly higher current of additional electrode may effectively decrease the crystal size and make the film structure denser; consequently the critical load of deposited films is enhanced. The sample deposited at additional electrode current of 30 A possesses the highest adhesion force between the film and the substrate （HF1）, and the best wear-resistance featured by narrowest wear tracks. The friction coefficient may decrease by 33% compared with that of the sample fabricated without the assistance of additional electrode. In summary cathodic arc deposition enhanced by additional electric field is effective means to fabricate TiCN films.