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Electrodeposition and characterization of ZnO thin films using sodium thiosulfate as an additive for photovoltaic solar cells

Electrodeposition and characterization of ZnO thin films using sodium thiosulfate as an additive for photovoltaic solar cells
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摘要 Zinc oxide thin films have been grown by electrodeposition technique onto Cu and ITO-coated glass substrates from an aqueous zinc nitrate solution with addition of sodium thiosulfate at 90 ℃.The effects of sodium thiosulfate on the electrochemical deposition of ZnO were investigated by cyclic voltammetry and chronoamperometry techniques.Deposited films were obtained at-0.60 V vs.SCE and characterized by XRD,SEM,FTIR,optical,photoelectrochemical and electrical measurements.Thickness of the deposited film was measured to be357 nm.X-ray diffraction results indicated that the synthesized ZnO has a pure hexagonal wurtzite structure with a marked preferential orientation along(002) plane.FTIR results confirmed the presence of ZnO films at peak558 cm^-1.SEM images showed uniform,compact morphology without any cracks and films composed of large flower-like ZnO agglomerates with star-shape.Optical properties of ZnO reveal a high optical transmission(〉80%)and high absorption coefficient(α 〉 10^5 cm^-1) in visible region.The optical energy band gap was found to be 3.28 eV.Photoelectrochemical measurements indicated that the ZnO films had n-type semiconductor conduction.Electrical properties of ZnO films showed a low electrical resistivity of 6.54 Ω·cm,carrier concentration of-1.3× 10^17cm^-3 and mobility of 7.35 cm^2V^-1s^-1. Zinc oxide thin films have been grown by electrodeposition technique onto Cu and ITO-coated glass substrates from an aqueous zinc nitrate solution with addition of sodium thiosulfate at 90 ℃.The effects of sodium thiosulfate on the electrochemical deposition of ZnO were investigated by cyclic voltammetry and chronoamperometry techniques.Deposited films were obtained at-0.60 V vs.SCE and characterized by XRD,SEM,FTIR,optical,photoelectrochemical and electrical measurements.Thickness of the deposited film was measured to be357 nm.X-ray diffraction results indicated that the synthesized ZnO has a pure hexagonal wurtzite structure with a marked preferential orientation along(002) plane.FTIR results confirmed the presence of ZnO films at peak558 cm^-1.SEM images showed uniform,compact morphology without any cracks and films composed of large flower-like ZnO agglomerates with star-shape.Optical properties of ZnO reveal a high optical transmission(〉80%)and high absorption coefficient(α 〉 10^5 cm^-1) in visible region.The optical energy band gap was found to be 3.28 eV.Photoelectrochemical measurements indicated that the ZnO films had n-type semiconductor conduction.Electrical properties of ZnO films showed a low electrical resistivity of 6.54 Ω·cm,carrier concentration of-1.3× 10^17cm^-3 and mobility of 7.35 cm^2V^-1s^-1.
出处 《Journal of Semiconductors》 EI CAS CSCD 2017年第5期11-17,共7页 半导体学报(英文版)
基金 Project supported by the Algerian Ministry of Higher Education and Scientific Research,Algeria(No.J0101520090018)
关键词 ELECTRODEPOSITION zinc oxide thin films SEMICONDUCTOR cyclic voltammetry Hall effect measurements electrodeposition zinc oxide thin films semiconductor cyclic voltammetry Hall effect measurements
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