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Multiple charge ion beam generation with a 2.45 GHz electron cyclotron resonance ion source

Multiple charge ion beam generation with a 2.45 GHz electron cyclotron resonance ion source
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摘要 Multiple charge ions (MCIs) are necessary for increasing the output energy of particles in accelerators. In general, MCI beams are largely produced by electron beam ion source (EBIS) [1], laser ion source (LIS) [2], or high-frequency (mostly >5 GHz) electron cyclotron resonance (ECR) ion source [3]. Among these, only ECR ion source can operate in the continuous wave (CW) mode, while EBIS and LIS only support pulses. In addition, ECR ion source with lower frequency (mostly 2.45 GHz) are required primarily for generating single charge state ions, because the corresponding ECR field (875 Gs) is not sufficiently strong for MCI generation [4]. Multiple charge ions (MCIs) are necessary for increasing the output energy of particles in accelerators. In general, MCI beams are largely produced by electron beam ion source (EBIS) [1], laser ion source (LIS) [2], or high-frequency (mostly 〉5 GHz) electron cyclotron resonance (ECR) ion source [3]. Among these, only ECR ion source can operate in the continuous wave (CW) mode, while EBIS and LIS only support pulses. In addition, ECR ion source with lower frequency (mostly 2.45 GHz) are required primarily for generating single charge state ions, because the corresponding ECR field (875 Gs) is not sufficiently strong for MCI generation [4].
出处 《Science China(Physics,Mechanics & Astronomy)》 SCIE EI CAS CSCD 2017年第6期74-77,共4页 中国科学:物理学、力学、天文学(英文版)
基金 supported by the National Natural Science Foundation of China (Grant No. 11575013) the National Basic Research Program of China (Grant No. 2014CB84550)
关键词 电子回旋共振离子源 多电荷离子 离子束 GHZ ECR离子源 MCIS 电子束离子源 激光离子源 mostly operate generating sufficiently primarily largely
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