摘要
采用电感耦合等离子体发射光谱法对硅铁中硅 ,铝的分析方法进行了试验研究 ,重点研究了内标试验、空白试验及第三元素干扰试验 ,通过试验找到了一个分析硅铁的准确可靠的方法 ,该方法灵敏度及准确度高 ,操作简便、快速。
The analyzing method for measuring Si,Al elements in silicon iron are studied by using inductance coupling plasma emission spectrum instrument.Stress research test interior standard,test blank and interfere,a kind of accurate and reliable method for analyzing silicon iron is achieved which has the advantages of high responsiveness,high accuray,simple and rapid operation.
出处
《哈尔滨商业大学学报(自然科学版)》
CAS
2002年第4期470-471,共2页
Journal of Harbin University of Commerce:Natural Sciences Edition
关键词
ICP-AES
硅铁
内标
干扰
ICP-AES
Ni alloy
interior standard
interfere
leave peak