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ICP-AES法测定二氧化硅标准物质中微量杂质元素的研究 被引量:1

Study on the determination of trace impurities in silicon dioxide standard reference material by ICP-AES
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摘要 本文研究建立ICP-AES测定Si O2标准物质中杂质元素含量的方法。钛、钙、镁、钠、铁、钴、铝、铜、锰、铅、铬、镍的质量浓度分别在0.1~1.5,0.05~1.0,0.05~1.0,0.05~1.0,0.05~2.0,0.1~1.0,0.05~2.5,0.1~1.0,0.1~1.0,0.1~1.0,0.05~1.0,0.05~1.0mg·L-1范围内与其光谱强度线性相关,相关系数均大于0.999;方法检出限分别为0.005,0.05,0.015,0.2,0.05,0.05,0.15,0.015,0.005,0.15,0.02,0.05mg·L-1,加标回收率均在90.0%~115.0%之间,测定结果的相对标准偏差均小于5%(n=6)。表明此方法准确度和精密度以及重复性,可用于Si O2标准物质中杂质的含量测定,也可用于高纯石英原料及制品的杂质含量分析。 This paper, determination of titanium, calcium, magnesium, Sodium, iron, cobalt, aluminum, cop- per, manganese,lead, chromium, nickel in by ICP-AES was established. The mass concentration of above-men- tioned elements respectively within 0.1-1.5, 0.05 -1.0, 0.05-1.0, 0.05 -1.0, 0.05-2.0, from 0.05-1.0, 0.05~2.5, 0.1-1.0,0.1-1.0, 0.1-1.0, 0.05~1.0, 0.05~1.0 mg L-1, mass concentration and spectral intensity was linear correla- tion, the correlation coefficients were greater than 0.999. The detection limit of titanium, calcium, magnesium, Sodi- um, iron, cobalt, aluminum, copper, manganese, lead, chromium, nickel respectively was 0.005, 0.05, 0.015, 0.2, 0.05, 0.05, 0.15, 0.015, 0.005, 0.15, 0.02, 0.05mg kg-1, the recoveries were 90.0%~115.0%, and the relative stan- dard deviations of determination results were less than 5% (n=6). The results show that the method can meet the requirements of determination of trace impurities in silicon dioxide standardreference material, also can be applied on the analysis of high-purity quartz raw material and related products.
出处 《化学工程师》 CAS 2017年第5期22-26,共5页 Chemical Engineer
基金 国家质量技术监督检验检疫总局科技项目(2015QK038)
关键词 二氧化硅标准物质 电感耦合等离子发射光谱 微量杂质 silicon dioxide standardreference material ICP-AES traee impurities
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