基于压电雾化喷涂的光刻胶涂覆工艺及其应用研究

Study on photoresist coating process and applications based on piezoelectric spray coating

本文在自主搭建的压电雾化喷涂系统上,以RFJ-210负性光刻胶为研究对象,抛光硅片为基材,分别研究了稀释体积比、速度以及距离等喷涂工艺对光刻胶薄膜平均厚度及均匀性的影响。并以表面具有非平面凸台结构的ITO玻璃为基材,分别进行压电雾化喷涂法和旋转法涂胶,实验结果表明:压电雾化喷涂法可以在三维形貌结构表面上涂覆,克服了传统旋转法无法在三维形貌结构表面上涂胶的缺陷,验证了压电雾化喷涂法在三维形貌结构表面应用中的可行性。

The effects of dilution volume ratio, velocity and distance on average thickness and uniformity of the film of RFJ-210 negative photoresist obtained on polished silicon wafer as substrate were analyzed by using a home-buih piezoelectric spraying system. The ITO glass with convex structure was coated with RFJ-210 by centrifugal spinning and piezoelectric spraying methods respectively. The results showed that clear and complete patterns can be formed on three- dimensional structures by piezoelectric spray coating, overcoming the problem that three-dimensional structures cannot be coated by centrifugal spinning method and proving feasibility of piezoelectric spraying for three-dimensional structures.